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Highly adherent diamond coatings deposited onto WC-Co cemented carbides via barrier interlayers

Published online by Cambridge University Press:  31 January 2011

J. M. Lopez
Affiliation:
Physics Department, Cayetano Heredia University, Av. Honorio Delgado 430, Lima 31, Peru
V. G. Babaev
Affiliation:
Department of Physical Electronics, Lomonosov Moscow State University, Vorobjevy Gory, Moscow, 119899 Russia
V. V. Khvostov
Affiliation:
Department of Physical Electronics, Lomonosov Moscow State University, Vorobjevy Gory, Moscow, 119899 Russia
J. M. Albella
Affiliation:
Instituto Ciencia de Materiales, Cantoblanco, 28049 Madrid, Spain
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Abstract

Diamond coatings have been deposited by plasma enhanced chemical vapor deposition (PCVD) onto WC-Co cemented carbides by use of specially developed barrier interlayers, well compatible with cemented carbides. The barrier interlayer comprises a Ti-based layer adjacent to the substrate, which completely prevents both substrate decarburization and Co diffusion from the substrate, and a diamond-bonding layer needed to obtain high adhesion to the diamond coating. The diamond-bond layer is obtained by seeding the surface with nanograined diamond particles by laser ablation. Diamond deposition under controlled parameters allows one to obtain fine-grained and uniform diamond coatings. The diamond coating obtained in this way has a high adhesion to the cemented carbide substrate due to the enhanced interaction through the nanograined diamond interlayer.

Type
Articles
Copyright
Copyright © Materials Research Society 1998

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References

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