Skip to main content Accessibility help
×
Home

Highly (200)-oriented Pt films on SiO2/Si substrates by seed selection through amorphization and controlled grain growth

  • Min Hong Kim (a1), Tae-Soon Park (a1), Dong-Su Lee (a1), Euijoon Yoon (a1), Dong-Yeon Park (a2), Hyun-Jung Woo (a2), Dong-Il Chun (a2) and Jowoong Ha (a2)...

Abstract

Highly (200)-oriented Pt films on SiO2/Si substrates were successfully prepared by a combination of a dc magnetron sputtering using Ar/O2 gas mixtures and subsequent controlled annealing. The intensity ratio of (200) to (111) planes (I200/I111) was over 200. The (200)-oriented Pt microcrystallites were less susceptible to amorphization due to their lower strain energy with oxygen incorporation than (111)-oriented ones. The controlled grain growth from the selected (200)-oriented seed microcrystallites during subsequent annealing provided a kinetic pathway where grain growth of the seed microcrystallites was predominant, while suppressing the nucleation of surface energy-driven, (111)-oriented seed microcrystallites and subsequent (111) preferred orientation.

Copyright

Corresponding author

References

Hide All
1.Moazzami, R., Semicond. Sci. Technol. 10, 375 (1995).
2.Sheppard, L.M., Ceram. Bull. 71, 85 (1992).
3.Scott, J. F. and Paz De Arauio, C. A., Science 246, 1400 (1989).
4.Al-Shareef, H. N., Gifford, K. D., Rou, S. H., Hren, P. D., Auciello, O., and Kingon, A., Integrated Ferroelectrics 3, 321 (1993).
5.Hren, P. D., Rou, S. H., Al-Shareef, H. N., Ameen, M. S., Auciello, O., and Kingon, A., Integrated Ferroelectrics 2, 311 (1992).
6.Okuyama, M. and Hamakawa, Y., Int. J. Eng. Sci. 29, 391 (1991).
7.Ogawa, T., Senda, A., and Kasnami, T., Jpn. J. Appl. Phys. 30, 2145 (1991).
8.Hwang, C. S., Park, S.O., Kang, C. S., Cho, H-J., Kang, H-K., Ahn, S. T., and Lee, M. Y., Jpn. J. Appl. Phys. 34, 5178 (1995).
9.Al-Shareef, H. N., Bellur, K. R., Auciello, O., and Kingon, A. I., Ferroelectrics 152, 85 (1994).
10.Iijima, K., Tomita, Y., Takayama, R., and Ueda, I., J. Appl. Phys. 60, 361 (1986).
11.Kim, S. and Baik, S., J. Vac. Sci. Technol. A 13, 95 (1995).
12.Hecq, M. and Hecq, A., J. Vac. Sci. Technol. 18, 219 (1981).
13.Kim, M. H., Park, T-S., Yoon, E., Lee, D-S., Park, D-Y., Woo, H-J., Chun, D-I., and Ha, J., J. Mater. Res. (1999, in press).
14.CRC Handbook of Chemistry and Physics, 68th ed. (CRC Press Inc. Boca Raton, FL, 1987).
15.Park, D-Y., Lee, D-S., Kim, M. H., Park, T-S., Woo, H-J., Yoon, E., Chun, D-I., and Ha, J., in Thin Films—Structure and Morphology, edited by Moss, S. C., Ila, D., Cammarata, R. C., Chason, E. H., Einstein, T. L., and Williams, E. D. (Mater. Res. Soc. Symp. Proc. 441, Pittsburgh, PA, 1997), p. 335.

Metrics

Altmetric attention score

Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed