Skip to main content Accessibility help

Electrodeposition of Fe–Co Alloys into Nanoporous p-type Silicon: Influence of the Electrolyte Composition

  • F. Hamadache (a1), J-L. Duvail (a2), V. Scheuren (a3), L. Piraux (a1), C. Poleunis (a1), P. Bertrand (a1) and M. S. Belkaïd (a4)...


The cathodic deposition of iron–cobalt alloys inside the pores of anodically formed nanoporous silicon (PS) from p-type Si substrate is investigated with respect to the electrolyte composition. The samples were characterized by scanning electron microscopy, energy dispersive spectrometry, Auger electron spectroscopy, and Fourier transform infrared spectroscopy. Results showed that the nucleation of pure cobalt started at the bottom of the pores and the nucleation of pure iron occurred all over the pore walls, leading to a preferential deposition on top surface of the porous layer. Nevertheless, a low concentration of Co2+ ions (5 at.%) in the electrolyte drastically improved the penetration of iron into the pores. As a result, a good filling of the pores with Co metal as well as with Fe–Co alloys was achieved. It was also shown that the deposition process oxidizes the structure mainly at the pore walls. The results of our investigation indicate that the mechanisms occurring during the electrodeposition of metals on porous p-type silicon substrates are completely different depending on the kind of electrolyte used: pure iron-based electrolyte or cobalt-based solutions. A complete understanding of the deposition process requires further analyses of the carrier transport in PS and of the charge exchange at the Si/electrolyte and PS/electrolyte interfaces. These new results involving the deposition of iron-group materials into porous p-type silicon are useful for future silicon technologies.



Hide All
1.Hérino, R., Mater. Sci. Eng., B 69–70, 70 (2000).
2.Renaux, C., Scheuren, V., and Flandre, D., Micrcelectron. Reliab. 40, 877 (2000).
3.Li, X.J., Zhu, De L., Chen, Q.W., and Zhang, Y.H., Appl. Phys. Lett. 74, 389 (1999).
4.Ronkel, F., Schultze, J.W., and Arens-Fischer, R., Thin Solid Films 276, 40 (1996).
5.Aylett, B.J., Harding, I.S., Earwaker, L.G., Forcey, K., and Giaddui, T., Thin Solid Films 276, 253 (1996).
6.Jeske, M., Schultze, J.W., Thönissen, M., and Münder, H., Thin Solid Films 255, 63 (1995).
7.Ito, T., Yoneda, T., Furuta, K., Hatta, A., and Hiraki, A., Jpn. J. Appl. Phys. 34, L649 (1995).
8.Steiner, P., Kozlowski, F., and Lang, W., Thin Solid Films 255, 49 (1995).
9.Izidinov, S.O., Nazarov, V.N., and Shcheglov, O.E., Russ. J. Appl. Chem. 68 (Part 1), 519 (1995).
10.Gusev, S.A., Korotkova, N.A., Rozenstein, D.B., and Fraerman, A.A., J. Appl. Phys. 76, 6671 (1994).
11.Anderson, D.G., Anwar, N., Aylett, B.J., Earwaker, L.G., Nasir, M.I., Farr, J.P.G., Stiebahl, K., and Keen, J.M., J. Organomet. Chem. 437, C7 (1992).
12.Ito, T., Yamama, A., Hiraki, A., and Satou, M., Appl. Surf. Sci. 41/ 42, 301 (1989).
13.Tsao, S.S., Blewer, R.S., and Tsao, J.Y., Appl. Phys. Lett. 49, 403 (1986).
14.Herino, R., Jan, P., and Bomchil, G., J. Electrochem. Soc. 132, 2513 (1985).
15.Tsuya, N., Saito, Y., Nakamura, H., Hayano, S., Furugohri, A., Ohta, K., Wakui, Y., and Tokushima, T., J. Magn. Magn. Mater. 54–57, 1681 (1986).
16.Whitney, T.M., Jiang, J.S., Searson, P., and Chien, C., Science 261, 1316 (1993).
17.Piraux, L., George, J.M., Despres, J.F., Leroy, C., Ferain, E., Legras, R., Ounadjla, K., and Fert, A., Appl. Phys. Lett. 65, 2484 (1994).
18.Zech, N., Podlaha, E.J., and Landolt, D., J. Appl. Electrochem. 28, 1251 (1998).
19.Ebothe´, J. and Vilain, S., J. Phys. D: Appl. Phys. 32, 2342 (1999).
20.Kakuno, E.M., Mosca, D.H., Mazzaro, I., Mattoso, N., Schreiner, W.H., and Gomes, M.A.B., J. Electrochem. Soc. 144, 3222 (1997).
21.Kakuno, E.M., Silva, R.C. da, Mattoso, N., Schreiner, W.H., Mosca, D.H., and Teixeira, S.R., J. Phys. D: Appl. Phys. 32, 1209 (1999).
22.Bohne, W., Reinsperger, G.U., Röhrich, J., Rôschert, G., and Selle, B., Nucl. Instrum. Methods Phys. Res. Sect. B 136–138, 273 (1998).
23.Hong, S., Pirri, C., Wetzel, P., and Gewinner, G., Phys. Rev. B 55, 13040 (1997).
24.Teichert, S., Kilper, R., Franke, T., Erben, J., Häussler, P., Henrion, W., Lange, H., and Panknin, D., Appl. Surf. Sci. 91, 56 (1995).
25. MultiPak Software Manual V5.0, Part No. 638366, Rev. A, 02 Oct. 1997 (Physical Electronics, Inc., Eden Prairie, MN, 1994–1997). p. C1.
26.Feng, Z.C., Wee, A.T.S., and Tan, K.L., J. Phys. D: Appl. Phys. 27, 1968 (1994).
27.Mizuno, H., Koyama, H., and Koshida, N., Appl. Phys. Lett. 69, 3779 (1996).
28.Hilliard, J., Andsager, D., L. Abu Hassan, Nayfeh, H.M., and Nayfeh, M.H., J. Appl. Phys. 76, 2423 (1994).
29.Ban, T., Koizumi, T., Haba, S., Koshida, N., and Suda, Y., Jpn. J. Appl. Phys. 33, 5603 (1994).
30.Xi, Y.H., Wilson, W.L., Ross, F.M., Mucha, J.A., Fitzgerald, E.A., Macaulay, J.M., and Harris, T.D., J. Appl. Phys. 71, 2403 (1992).
31.Hory, M.A., Hérino, R., Ligeon, M., Muller, F., Gaspard, F., Mihalcescu, I., and Vial, J.C., Thin Solid Films 255, 200 (1995).
32.Brenner, A., Electrodeposition of alloys (Academic, New York, 1963).
33.Gao, L.J., Anderson, G.W., and Norton, P.R., J. Appl. Phys. 79, 5795 (1995).
34.Ben-Chorin, M., Möller, F., and Koch, F., Phys. Rev. B 49, 2981 (1994).
35.Pulsford, N.J., Rikken, G.L.J.A., Kessener, Y.A.R.R., Lous, E.J., and Venhuizen, A.H.J., J. Appl. Phys. 75, 636 (1994).
36.Steivenard, D. and Deresmes, D., Appl. Phys. Lett. 67, 1570 (1995).
37.Bsiesy, A., Gelloz, B., Gaspard, F., and Muller, F., J. Appl. Phys. 276, 175 (1996).
38.Ray, A.K., Mabrook, M.F., Nabok, A.V., and Brown, S., J. Appl. Phys. 84, 3232 (1998).
39.Goryachev, D.N., Polisskii, G., and Sreseli, O.M., Fiz. Tekh. Poluprovodn. (S. Peterburg) 34, 221 (2000) [Semiconductors 34, 227 (2000)].
40.Jeske, M., Schultze, J.W., and Münder, H., Electrochim Acta 40, 1435 (1995).
41.Montès, L., Muller, F., Gaspard, F., and Hérino, R., Thin Solid Films 29, 35 (1997).

Related content

Powered by UNSILO

Electrodeposition of Fe–Co Alloys into Nanoporous p-type Silicon: Influence of the Electrolyte Composition

  • F. Hamadache (a1), J-L. Duvail (a2), V. Scheuren (a3), L. Piraux (a1), C. Poleunis (a1), P. Bertrand (a1) and M. S. Belkaïd (a4)...


Altmetric attention score

Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed.