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Effect of surface structures upon ultrathin film interference fringes

Published online by Cambridge University Press:  03 March 2011

Lu Taijing ,
Tomoya Ogawa ,
Koichi Toyoda  and
Zhenguo Wang
Lu Taijing
Affiliation:
Department of Physics, National University of Singapore, Kent Ridge, Singapore 0511, Singapore
Tomoya Ogawa
Affiliation:
Department of Physics, Gakushuin University, Mejiro 1-5-1, Toshima-ku, Tokyo, 171 Japan
Koichi Toyoda
Affiliation:
Laser Science Research Group, Institute of Physical and Chemical Research (RIKEN), Wako, Saitama, 351-01 Japan
Zhenguo Wang
Affiliation:
Institute of Semiconductors, Academia Sinica, Box 912, Beijing, 100083 China
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Abstract

Effect of surface structures upon ultrathin film interference fringes generated from extremely thin films or epitaxial layers grown on semiconductor wafers has been studied. Since dark regions of fringes correspond to the places where the thin films are destroyed or absent, the fringes are investigated to detect uneven surfaces with undesired structures. Therefore, surface microstructures can be detected and characterized effectively by the modification of the fringes.

Type
Articles
Information
Journal of Materials Research , Volume 8 , Issue 9 , September 1993 , pp. 2315 - 2318
Copyright
Copyright © Materials Research Society 1993

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References

REFERENCES

1Taijing, L., Toyoda, K., Lian, L., Nango, N., and Ogawa, T., J. Mater. Res. 7, 2182 (1992).CrossRefGoogle Scholar
2Ogawa, T., Taijing, L., and Toyoda, K., Jpn. J. Appl. Phys. 30 (8A), 1497 (1991).CrossRefGoogle Scholar