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Effect of N2 flow on the structure and mechanical properties of (CrTaTiVZr)Nx coatings processed by reactive magnetron sputtering

Published online by Cambridge University Press:  16 April 2015

Zue-Chin Chang ,
Du-Cheng Tsai  and
Erh-Chiang Chen
Zue-Chin Chang*
Affiliation:
Department of Mechanical Engineering, National Chin-Yi University of Technology, Taichung 411, Republic of China
Du-Cheng Tsai
Affiliation:
Department of Materials Science and Engineering, National Chung Hsing University, Taichung 40227, Republic of China
Erh-Chiang Chen
Affiliation:
Department of Materials Science and Engineering, National Chung Hsing University, Taichung 40227, Republic of China
*
a)Address all correspondence to this author. e-mail: changcy7188@gmail.com
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Abstract

(CrTaTiVZr)Nx coatings were deposited via reactive radio frequency magnetron sputtering. The effects of N2 flow at 0–8 SCCM on the chemical composition, microstructure, and mechanical properties of the films were investigated. The coatings deposited at a N2 flow of ≤2 SCCM showed a featureless structure with an amorphous phase. When the N2 flow was at 4 SCCM, two distinct layers were observed, namely, the bottom layer (close to the substrate) with an amorphous structure and the top layer with a fibrous structure and face-centered cubic phase. When the N2 flow was further increased, the structure was converted from fibers to columns with larger grains. Accordingly, the maximum hardness value of 36.4 GPa was achieved at a N2 flow of 4 SCCM, thereby indicating that (CrTaTiVZr)Nx coatings may be suitable as hard protective coatings.

Type
Articles
Information
Journal of Materials Research , Volume 30 , Issue 7 , 14 April 2015 , pp. 924 - 934
Copyright
Copyright © Materials Research Society 2015 

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References

REFERENCES

Yeh, J.W., Chen, S.K., Lin, S.J., Gan, J.Y., Chin, T.S., Shun, T.T., Tsau, C.H., and Chang, S.Y.: Nanostructured high-entropy alloys with multiple principal elements: Novel alloy design concepts and outcomes. Adv. Eng. Mater. 6, 299 (2004).CrossRefGoogle Scholar
Chen, Y.Y., Duval, T., Hung, U.D., Yeh, J.W., and Shih, H.C.: Microstructure and electrochemical properties of high entropy alloys—A comparison with type-304 stainless steel. Corros. Sci. 47, 2257 (2005).CrossRefGoogle Scholar
Yeh, J.W., Chen, S.K., Gan, J.Y., Lin, S.J., Chin, T.S., Shun, T.T., Tsau, C.H., and Chang, S.Y.: Formation of simple Crystal structures in Cu-Co-Ni-Cr-al-Fe-Ti-V alloys with multiprincipal metallic elements. Metall. Mater. Trans. A 35, 2533 (2004).CrossRefGoogle Scholar
Craievich, P.J., Weinert, M., Sanchez, J.M., and Watson, R.E.: Local stability of nonequilibrium phases. Phys. Rev. Lett. 72, 3076 (1994).CrossRefGoogle ScholarPubMed
Takeuchi, A., Chen, N., Wada, T., Yokoyama, Y., Kato, H., Inoue, A., and Yeh, J.W.: Pd20Pt20Cu20Ni20P20 high-entropy alloy as a bulk metallic glass in the centimeter. Intermetallics 19, 1546 (2011).CrossRefGoogle Scholar
Ding, H.Y. and Yao, K.F.: High entropy Ti20Zr20Cu20Ni20Be20 bulk metallic glass. J. Non-Cryst. Solids 364, 9 (2013).CrossRefGoogle Scholar
Lai, C.H., Lin, S.J., Yeh, J.W., and Chang, S.Y.: Preparation and characterization of AlCrTaTiZr multi-element nitride coatings. Surf. Coat. Technol. 201, 3275 (2006).CrossRefGoogle Scholar
Liang, S.C., Chang, Z.C., Tsai, D.C., Lin, Y.C., Sung, H.S., Deng, M.J., and Shieu, F.S.: Effects of substrate temperature on the structure and mechanical properties of (TiVCrZrHf)N coatings. Appl. Surf. Sci. 257, 7709 (2011).CrossRefGoogle Scholar
Tsai, M.H., Lai, C.H., Yeh, J.W., and Gan, J.Y.: Effects of nitrogen flow ratio on the structure and properties of reactively sputtered (AlMoNbSiTaTiVZr)Nx coatings. J. Phys. D: Appl. Phys. 41, 235402 (2008).CrossRefGoogle Scholar
Tsai, M.H., Wang, C.W., Lai, C.H., Yeh, J.W., and Gan, J.Y.: Thermally stable amorphous (AlMoNbSiTaTiVZr)50N50 nitride film as diffusion barrier in copper metallization. Appl. Phys. Lett. 92, 052109 (2008).CrossRefGoogle Scholar
Pierson, H.O.: Handbook of Refractory Carbides and Nitrides, 1st ed. (Noyes Publications, Westwood, New Jersey, 1996).Google Scholar
Gulbiński, W., Suszko, T., and Pailharey, D.: High load AFM friction and wear experiments on V2O5 thin films. Wear 254, 988 (2003).CrossRefGoogle Scholar
Mayrhofer, P.H., Willmann, H., and Mitterer, C.: Oxidation kinetics of sputtered Cr–N hard coatings. Surf. Coat. Technol. 146, 222 (2001).CrossRefGoogle Scholar
Tsai, D.C., Huang, Y.L., Lin, S.R., Jung, D.R., Chang, S.Y., and Shieu, F.S.: Structure and mechanical properties of (TiVCr)N coatings prepared by energetic bombardment sputtering with different nitrogen flow ratios. J. Alloys Compd. 509, 3141 (2011).CrossRefGoogle Scholar
Abadias, G., Koutsokeras, L.E., Siozios, A., and Patsalas, P.: Stress, phase stability and oxidation resistance of ternary Ti–Me–N (Me=Zr, Ta). Thin Solid Films 538, 56 (2013).CrossRefGoogle Scholar
Chang, H.W., Huang, P.K., Davison, A., Yeh, J.W., Tsau, C.H., and Yang, C.C.: Nitride films deposited from an equimolar Al–Cr–Mo–Si–Ti Alloy target by reactive direct current magnetron sputtering. Thin Solid Films 516, 6402 (2008).CrossRefGoogle Scholar
Tsai, D.C., Huang, Y.L., Lin, S.R., Liang, S.C., and Shieu, F.S.: Effect of nitrogen flow ratios on the structure and mechanical properties of (TiVCrZrY)N coatings prepared by reactive magnetron sputtering. Appl. Surf. Sci. 257, 1361 (2010).CrossRefGoogle Scholar
Tsai, D.C., Chang, Z.C., Kuo, B.H., Shiao, M.H., Chang, S.Y., and Shieu, F.S.: Structure and properties of (TiVCrZrY)N coatings prepared by energetic bombardment sputtering with different nitrogen flow ratios. Appl. Phys. A 115, 1205 (2014).CrossRefGoogle Scholar
Larsson, M., Bromark, M., Hedenqvist, P., and Hogmark, S.: Deposition and mechanical properties of multilayered PVD Ti–TiN coatings. Surf. Coat. Technol. 76, 202 (1995).CrossRefGoogle Scholar
Oliver, W.C. and Pharr, G.M.: Measurement of hardness and elastic modulus by instrumented indentation: Advances in understanding and refinements to methodology. J. Mater. Res. 19, 3 (2004).CrossRefGoogle Scholar
Mason, R.M. and Pichiling, M.: Sputtering in a glow discharge ion source-pressure dependence: Theory and experiment. J. Phys. D: Appl. Phys. 27, 2363 (1994).CrossRefGoogle Scholar
Hasegawa, H., Kimura, A., and Suzuki, T.: Ti1-xAlxN, Ti1-xZrxN and Ti1-xCrxN films synthesized by the AIP method. Surf. Coat. Technol. 132, 76 (2000).CrossRefGoogle Scholar
Hones, P., Sanjinés, R., and Lévy, F.: Sputter deposited chromium nitride based ternary compounds for hard coatings. Thin Solid Films 332, 240 (1998).CrossRefGoogle Scholar
Klug, H.P. and Alexander, L.E.: X-Ray Diffraction Procedures for Polycrystalline and Amorphous Materials, 2nd ed. (Wiley&Sons, New York, 1974).Google Scholar
Dean, J.A.: Lange’s Handbook of Chemistry, 16th ed. (McGraw-Hill, New York, 1999).Google Scholar
Kappertz, O., Drese, R., and Wuttig, M.: Correlation between structure, stress and deposition parameters in direct current sputtered zinc oxide films. J. Vac. Sci. Technol., A 20, 2084 (2002).CrossRefGoogle Scholar
Huang, P.K. and Yeh, J.W.: Effects of nitrogen content on structure and mechanical properties of multi-element (AlCrNbSiTiV)N coating. Surf. Coat. Technol. 203, 1891 (2009).CrossRefGoogle Scholar
Mahieu, S., Ghekiere, P., Winter, G.D., Gryse, R.D., Depla, D., Tendeloo, G.V., and Lebedev, O.I.: Biaxially aligned titanium nitride thin films deposited by reactive unbalanced magnetron sputtering. Surf. Coat. Technol. 200, 2764 (2006).CrossRefGoogle Scholar
Tsai, D.C., Chang, Z.C., Kuo, B.H., Shiao, M.H., Chang, S.Y., and Shieu, F.S.: Structural morphology and characterization of (AlCrMoTaTi)N coating deposited via magnetron sputtering. Appl. Surf. Sci. 282, 789 (2013).CrossRefGoogle Scholar
van der Drift, A.: Evolutionary selection, a principle governing growth orientation in vapor-deposited layers. Philips Res. Rep. 22, 267 (1967).Google Scholar
Hu, G., Kong, X., Wang, Y., Wan, L., and Duan, X.: Formation mechanism of amorphous layer at the interface of Si(111) substrate and AlN buffer layer for GaN. J. Mater. Sci. Lett. 22, 1581 (2003).CrossRefGoogle Scholar
Song, J.H., Wang, S.C., Sung, J.C., Huang, J.L., and Lii, D.F.: Characterization of reactively sputtered C-axis orientation (Al, B)N films on diamond. Thin Solid Films 517, 4753 (2009).CrossRefGoogle Scholar
Kim, J.G. and Jin, Yu.: Behavior of residual stress on CVD diamond films. Mater. Sci. Eng., B 57, 24 (1998).CrossRefGoogle Scholar
Tsai, D.C., Chang, Z.C., Kuo, L.Y., Lin, T.J., Lin, T.N., and Shieu, F.S.: Solid solution coating of (TiVCrZrHf)N with unusual structural evolution. Surf. Coat. Technol. 217, 84 (2013).CrossRefGoogle Scholar
Veprek, S.: The search for novel, superhard materials. J. Vac. Sci. Technol., A 17, 2401 (1999).CrossRefGoogle Scholar
Veprek, S. and Argon, A.S.: Towards the understanding of mechanical properties of super- and ultrahard nanocomposites. J. Vac. Sci. Technol., B 20, 650 (2002).CrossRefGoogle Scholar