Skip to main content Accessibility help

Dielectric properties of epitaxial KNbO3 ferroelectric thin films

  • Soma Chattopadhyay (a1), B. M. Nichols (a1), Jin-Ha Hwang (a1), T. O. Mason (a1) and B. W. Wessels (a1)...


The dielectric response of KNbO3 epitaxial ferroelectric thin films was measured as a function of bias, frequency, and temperature. Thin films with a thickness of 80 to 350 nm were deposited on spinel substrates by low-pressure metalorganic chemical vapor deposition. Bias dependence measurements showed hysteresis in the dielectric response. The dielectric constant decreased with bias, and the tunability was calculated to be between 35% and 42% for an applied field of 7 MV/cm. The frequency dependence of the dielectric constant followed a power law. A pronounced thickness effect was observed in the dielectric response, especially at the Curie temperature. With decreasing thickness, the dielectric constant and the loss tangent decreased. A diffuse ferroelectric phase transition was observed for films with a thickness less than 350 nm.



Hide All
1.Holman, R.L., Johnson, L.M. Althouse, and Skinner, D.P., Opt. Eng. 26, 134 (1987).
2.Nystrom, M.J., Wessels, B.W., Chen, J., and Marks, T.J., Appl. Phys. Lett. 68, 761 (1996).
3.Hoerman, B.H., Nichols, B.M., Nystrom, M.J., and Wessels, B.W., Appl. Phys. Lett. 75, 2707 (1999).
4.Shirane, G., Danner, H., Pavlovic, A., and Pepinsky, R., Phys. Rev. 93, 672 (1954).
5.Dubernet, P. and Ravez, J., Ferroelectrics 211, 51 (1998).
6.Ding, S. and Shen, J., J. Am. Ceram. Soc. 73, 1449 (1990).
7.Zgonik, M., Nakagawa, K., and Gunter, P., J. Opt. Soc. Am. B 12, 1416 (1995).
8.Lee, C. and Lee, S., Ferroelectr. Lett. 24, 131 (1998).
9.Errandonea, D. and Moya, E., Phys. Status Solidi B 203, R1 (1997).
10.Kim, S.H., Yang, Y.S., Lee, S.J., Cha, J.H., Chae, B.G., Joo, H.J., and Jang, M.S., J. Korean. Phys. Soc. 29, S785 (1996).
11.Wang, C.Z., Yu, R.C., and Krakauer, H., Ferroelectrics 194, 97 (1997).
12.Hoerman, B.H., Ford, G.M., Kaufman, L.D., and Wessels, B.W., Appl. Phys. Lett. 73, 2248 (1998).
13.Farnell, G.W., Cermak, I.A., Silvestar, P., and Wong, S.K., IEEE Trans. Sonics Ultrason. SU–17, 188 (1970).
14.Jonscher, A.K., Dielectric Relaxation in Solids (Chelsea Dielectrics, London, United Kingdom, 1983).
15.Wessels, B.W., Nystrom, M.J., Chen, J., Studebaker, D., and Marks, T.J., in Epitaxial Oxide Thin Films II, edited by Speck, J.S., Fork, D.K., Wolf, R.M., and Shiosaki, T. (MRS Symp. Proc. 401, Pittsburgh, PA, 1996), p. 211.


Full text views

Total number of HTML views: 0
Total number of PDF views: 0 *
Loading metrics...

Abstract views

Total abstract views: 0 *
Loading metrics...

* Views captured on Cambridge Core between <date>. This data will be updated every 24 hours.

Usage data cannot currently be displayed