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Deposition of nitrides and oxides of aluminum and titanium by pulse laser irradiation

Published online by Cambridge University Press:  31 January 2011

S.R. Nishitani ,
S. Yoshimura ,
H. Kawata  and
M. Yamaguchi
S.R. Nishitani
Affiliation:
Department of Metal Science and Technology, Kyoto University, Sakyo-ku, Kyoto 606-01, Japan
S. Yoshimura
Affiliation:
Department of Metal Science and Technology, Kyoto University, Sakyo-ku, Kyoto 606-01, Japan
H. Kawata
Affiliation:
Department of Metal Science and Technology, Kyoto University, Sakyo-ku, Kyoto 606-01, Japan
M. Yamaguchi
Affiliation:
Department of Metal Science and Technology, Kyoto University, Sakyo-ku, Kyoto 606-01, Japan
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Abstract

Deposits of nitrides and oxides of Al and Ti have been produced by laser irradiation of Al and Ti targets in air, N2, and NH3 + N2 gases. Microstructure and constituent phases in these deposits have been examined by scanning electron microscopy (SEM), transmission electron microscopy (TEM), and x-ray diffractometry (XRD). The distribution of metalloid elements has been investigated by Rutherford backscattering spectrometry (RBS). On the basis of the results of these examinations, the nitride and oxide deposits have been shown to be formed by reactions between ambient gas and metal-melt or metal-vapor which take place during pulse laser irradiation.

Type
Articles
Information
Journal of Materials Research , Volume 7 , Issue 3 , March 1992 , pp. 725 - 733
Copyright
Copyright © Materials Research Society 1992

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