- Cited by 26
Yashar, Philip C. and Sproul, William D. 1999. Nanometer scale multilayered hard coatings. Vacuum, Vol. 55, Issue. 3-4, p. 179.
DeLoach, J. D. Shibilski, J. J. Crape, C. R. and Aita, C. R. 2000. Phase development in annealed zirconia-titania nanolaminates. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 18, Issue. 6, p. 2922.
Aita, C. R. DeLoach, J. D. and Yakovlev, V. V. 2002. (Zr,Ti)O2 interface structure in ZrO2–TiO2 nanolaminates with ultrathin periodicity. Applied Physics Letters, Vol. 81, Issue. 2, p. 238.
Palmquist, J.-P. Czigany, Zs. Odén, M. Neidhart, J. Hultman, L. and Jansson, U. 2003. Magnetron sputtered W–C films with C60 as carbon source. Thin Solid Films, Vol. 444, Issue. 1-2, p. 29.
Aita, C.R. 2004. Zirconia-metal (Al, Y, Ti) oxide nanolaminate films. Surface and Coatings Technology, Vol. 188-189, Issue. , p. 179.
Lun, Wei Nan, Shao Fanghua, Mei Geyang, Li and Jianguo, Li 2005. Kind of oxide-composed superhard nanomultilayer prepared by magnetron sputtering. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 23, Issue. 3, p. 539.
Wei, Lun Mei, Fanghua Shao, Nan Kong, Ming Li, Geyang and Li, Jianguo 2005. Template-induced crystallization of amorphous SiO2 and its effects on the mechanical properties of TiN∕SiO2 nanomultilayers. Applied Physics Letters, Vol. 86, Issue. 2, p. 021919.
Wei, Lun Kong, Ming Dong, Yunshan and Li, Geyang 2005. Crystallization of Al2O3 and its effects on the mechanical properties in TiN∕Al2O3 nanomultilayers. Journal of Applied Physics, Vol. 98, Issue. 7, p. 074302.
Fox-Rabinovich, G.S. Yamamoto, K. Veldhuis, S.C. Kovalev, A.I. Shuster, L.S. and Ning, L. 2006. Self-adaptive wear behavior of nano-multilayered TiAlCrN/WN coatings under severe machining conditions. Surface and Coatings Technology, Vol. 201, Issue. 3-4, p. 1852.
CLEGG, W J GIULIANI, F LONG, Y LLOYD, S J and MOLINA-ALDAREGUIA, J M 2006. Ceramic-Matrix Composites. p. 216.
Long, Y. Giuliani, F. Lloyd, S.J. Molina-Aldareguia, J. Barber, Z.H. and Clegg, W.J. 2006. Deformation processes and the effects of microstructure in multilayered ceramics. Composites Part B: Engineering, Vol. 37, Issue. 6, p. 542.
Yue, Jianling Liu, Yan Zhao, Wenji and Li, Geyang 2006. Crystallization of AlON and its effects on the growth and hardness of reactively synthesized VN/AlON nanomultilayer. Scripta Materialia, Vol. 55, Issue. 10, p. 895.
Dong, Yunshan Yue, Jianling Liu, Yan and Li, Geyang 2006. Crystallization of AlON layers and its effects on the microstructure and hardness of reactively synthesized ZrN/AlON nanomultilayers. Journal of Physics D: Applied Physics, Vol. 39, Issue. 22, p. 4838.
Park, Pan Kwi Cha, Eun-Soo and Kang, Sang-Won 2007. Interface effect on dielectric constant of HfO2∕Al2O3 nanolaminate films deposited by plasma-enhanced atomic layer deposition. Applied Physics Letters, Vol. 90, Issue. 23, p. 232906.
Barshilia, Harish C. Deepthi, B. and Rajam, K. S. 2008. Stabilization of tetragonal and cubic phases of ZrO2 in pulsed sputter deposited ZrO2/Al2O3 and ZrO2/Y2O3 nanolayered thin films. Journal of Applied Physics, Vol. 104, Issue. 11, p. 113532.
Zhao, Wenji Kong, Ming Wu, Ying and Li, Geyang 2008. Pseudocrystallization of SiO2 and superhardness effects of AlN∕SiO2 nanomultilayers. Journal of Applied Physics, Vol. 103, Issue. 4, p. 043506.
Freyman, Christina A. and Chung, Yip-Wah 2008. Synthesis and characterization of hardness-enhanced multilayer oxide films for high-temperature applications. Surface and Coatings Technology, Vol. 202, Issue. 19, p. 4702.
Eklund, P. Mikkelsen, N.-J. Sillassen, M. Bienk, E.J. and Bøttiger, J. 2008. Chromium oxide-based multilayer coatings deposited by reactive magnetron sputtering in an industrial setup. Surface and Coatings Technology, Vol. 203, Issue. 1-2, p. 156.
Kong, Ming Wu, Xiaoyan Huang, Bilong and Li, Geyang 2009. Epitaxial growth and superhardness effect of TiN/AlON nanomultilayers synthesized by reactive magnetron sputtering technology. Journal of Alloys and Compounds, Vol. 485, Issue. 1-2, p. 435.
Barshilia, Harish Deepthi, B and Rajam, K 2010. p. 427.
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Polycrystalline Y2O3/ZrO2 superlattice thin films were deposited using opposedcathode reactive magnetron sputtering. Pulsed direct-current power was used to eliminate arcing on the metallic targets. Radio-frequency power was applied to the substrates to achieve ion bombardment of the growing film. In order to reproducibly deposit at high rates in Ar–O2 mixtures, the Y target voltage was used to indirectly feedback-control the O2 partial pressure. Deposition rates as high as ∼70% of the pure metal rates were achieved, typically 3.5 μm/h. Superlattices with periods ranging from 2.6 to 95 nm were deposited. Y2O3 layer thicknesses were either 75% or 50% of the superlattice period. X-ray diffraction and transmission electron microscopy studies showed well-defined superlattice layers. The ZrO2 layers exhibited the high-temperature cubic-fluorite structure, which was epitaxially stabilized by the cubic Y2O3 layers, for thicknesses ≤7 nm. The equilibrium monoclinic structure was observed for thicker ZrO2 layers. Nanoindentation hardnesses ranged from 11.1 to 14.5 GPa with little dependence on period. The hardness results are discussed in terms of current superlattice hardening theories.
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