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Composition control of radio-frequency magnetron sputter-deposited La0.5Sr0.5CoO3−∂ thin films

Published online by Cambridge University Press:  31 January 2011

D. O. Klenov ,
W. Donner ,
L. Chen ,
A. J. Jacobson  and
S. Stemmer
D. O. Klenov*
Affiliation:
Materials Department, University of California, Santa Barbara, California 93106–5050
W. Donner
Affiliation:
Department of Physics, University of Houston, Houston, Texas 77204–5005
L. Chen
Affiliation:
Department of Chemistry, University of Houston, Houston, Texas 77204–5500
A. J. Jacobson
Affiliation:
Department of Chemistry, University of Houston, Houston, Texas 77204–5500
S. Stemmer*
Affiliation:
Materials Department, University of California, Santa Barbara, California 93106–5050
*
a) e-mail: d.o.klenov@physics.or
b) e-mail: stemmer@mrl.ucsb.edu
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Abstract

For this paper, we used radio-frequency (rf) sputter deposition to synthesize epitaxial La0.5Sr0.5CoO3−∂ (LSCO) films. We investigated the influence of sputter deposition parameters, in particular, oxygen partial pressure, plasma power, total sputter pressure, and post-deposition cooling atmosphere on film composition, microstructure, and electrical resistivity. We show that rf sputtering from a single target can produce LSCO films with La/Sr and (La + Sr)/Co ratios of unity and with low electrical resistivities of about 1 mΩ cm. Film microstructures were characterized by high-resolution transmission electron microscopy and x-ray diffraction. Formation of an ordered film superlattice, most likely due to oxygen vacancy ordering, was observed. In this paper, we discuss the relationship between the film microstructure and the electrical resistivity.

Type
Articles
Information
Journal of Materials Research , Volume 18 , Issue 1 , January 2003 , pp. 188 - 194
Copyright
Copyright © Materials Research Society 2003

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References

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