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Secondary Phase Formation and Microstructural Development in the Interaction Between SrBi2Ta2O9 Films and Pt/Ti/SiO2/Si Substrates

Published online by Cambridge University Press:  31 January 2011

Chung-Hsin Lu
Affiliation:
Department of Chemical Engineering, National Taiwan University, Taipei, Taiwan, Republic of China
Buh-Kuan Fang
Affiliation:
Department of Chemical Engineering, National Taiwan University, Taipei, Taiwan, Republic of China
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Abstract

The phase formation and microstructural development of SrBi2Ta2O9 thin films prepared via spin-coating using metalorganic solution on Pt/Ti/SiO2/Si substrates have been investigated in this study. The spun-on films started to crystallize from above 550 °C and were well crystallized at 800 °C. At higher than 850 °C a secondary phase having a pyrochlore structure was formed in the films. The analysis of EDS and SIMS confirmed that the interaction between the films and the titanium species which diffused outward from the titanium layer on substrates was the origin for the occurrence of the pyrochlore phase. In addition, varying the thickness of the coated films and platinum layers had remarkable influence on the formation amount of the pyrochlore phase.

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Copyright
Copyright © Materials Research Society 1997

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Secondary Phase Formation and Microstructural Development in the Interaction Between SrBi2Ta2O9 Films and Pt/Ti/SiO2/Si Substrates
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