Crossref Citations
This article has been cited by the following publications. This list is generated based on data provided by
Crossref.
Chiu, S. L.
Chu, Y. C.
Tsai, C. J.
and
Lee, H. Y.
2004.
Effects of Ti Interlayer on Ni/Si Reaction Systems.
Journal of The Electrochemical Society,
Vol. 151,
Issue. 7,
p.
G452.
Qu, Xin-Ping
Jiang, Yu-Long
Ru, Guo-Ping
Lu, Fang
Li, Bing-Zong
Detavernier, C.
and
Van Meirhaeghe, R.L.
2004.
Thermal stability, phase and interface uniformity of Ni-silicide formed by Ni–Si solid-state reaction.
Thin Solid Films,
Vol. 462-463,
Issue. ,
p.
146.
Özcan, Ahmet S.
Ludwig, Karl F.
Detavernier, Christophe
Lavoie, Christian
and
Jordan-Sweet, Jean L.
2004.
Axiotaxy of CoSi2 thin films on Si(100) substrates and the effects of Ti alloying.
Journal of Applied Physics,
Vol. 95,
Issue. 12,
p.
8376.
Detavernier, C.
Lavoie, C.
d’Heurle, F. M.
Bender, H.
and
Van Meirhaeghe, R. L.
2004.
Low-temperature formation of CoSi2 in the presence of Au.
Journal of Applied Physics,
Vol. 95,
Issue. 10,
p.
5340.
Deduytsche, D.
Detavernier, C.
Van Meirhaeghe, R. L.
Jordan-Sweet, J. L.
and
Lavoie, C.
2007.
Formation and morphological stability of NiSi in the presence of W, Ti, and Ta alloying elements.
Journal of Applied Physics,
Vol. 101,
Issue. 4,
Opsomer, K.
Deduytsche, D.
Detavernier, C.
Van Meirhaeghe, R. L.
Lauwers, A.
Maex, K.
and
Lavoie, C.
2007.
Influence of Ge substrate crystallinity on Co germanide formation in solid-state reactions.
Applied Physics Letters,
Vol. 90,
Issue. 3,
Tan, S. Y.
Sung, C. L.
and
Wu, W. F.
2007.
A thermally robust Ni-FUSI process using in 65 nm CMOS technology.
Journal of Materials Science: Materials in Electronics,
Vol. 18,
Issue. 8,
p.
847.
Burnette, James E.
Kiesel, Sharon
Sayers, Dale E.
and
Nemanich, Robert J.
2008.
Titanium Interlayer Mediated Epitaxy of CoSi2 on Si1−xGex.
Thin Solid Films,
Vol. 516,
Issue. 8,
p.
1809.
Smeets, D.
Vantomme, A.
De Keyser, K.
Detavernier, C.
and
Lavoie, C.
2008.
The role of lattice mismatch and kinetics in texture development: Co1−xNixSi2 thin films on Si(100).
Journal of Applied Physics,
Vol. 103,
Issue. 6,
Deduytsche, D.
Detavernier, C.
Van Meirhaeghe, R. L.
Jordan-Sweet, J. L.
and
Lavoie, C.
2008.
Formation and stability of NiSi in the presence of Co and Fe alloying elements.
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,
Vol. 26,
Issue. 6,
p.
1971.
Tan, S. Y.
Chiu, Hsien-Chia
Chen, Yi-Yang
and
Sung, C. L.
2008.
Formation and simulation of a thermally stable NiSi FUSI gate electrode by a novel integration process.
Journal of Materials Science: Materials in Electronics,
Vol. 19,
Issue. 5,
p.
411.
Mogilatenko, A.V.
Allenstein, Frank
Schubert, M.A.
Falke, Meiken
Beddies, G.
and
Neumann, Wolfgang
2010.
Structural Changes in Nickel Silicide Thin Films under the Presence of Al and Ga.
Materials Science Forum,
Vol. 638-642,
Issue. ,
p.
2938.
Van Bockstael, C.
De Keyser, K.
Demeulemeester, J.
Vantomme, A.
Van Meirhaeghe, R.L.
Detavernier, C.
Jordan-Sweet, J.L.
and
Lavoie, C.
2010.
In situ study of the formation of silicide phases in amorphous Co–Si mixed layers.
Microelectronic Engineering,
Vol. 87,
Issue. 3,
p.
282.
Mogilatenko, A.
Beddies, G.
Falke, M.
Häusler, I.
and
Neumann, W.
2012.
Microstructure analysis of novel ternary NiSi2−xAlx silicide layers on Si(001) formed by solid-state reaction.
Journal of Applied Physics,
Vol. 111,
Issue. 10,
Zhu, Zhiwei
Gao, Xindong
Piao, Yinghua
Hu, Cheng
Qiu, Zhijun
Zhang, Zhi-Bin
Wu, Dongping
and
Zhang, Shi-Li
2012.
Phase formation and film morphology of ultrathin Co1−xNixSi2 films.
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films,
Vol. 30,
Issue. 5,
Putero, M.
and
Mangelinck, D.
2012.
Effect of Pd on the Ni2Si stress relaxation during the Ni-silicide formation at low temperature.
Applied Physics Letters,
Vol. 101,
Issue. 11,
Schrauwen, A.
Demeulemeester, J.
Kumar, A.
Vandervorst, W.
Comrie, C. M.
Detavernier, C.
Temst, K.
and
Vantomme, A.
2013.
On the nucleation of PdSi and NiSi2 during the ternary Ni(Pd)/Si(100) reaction.
Journal of Applied Physics,
Vol. 114,
Issue. 6,
De Schutter, B.
De Keyser, K.
Lavoie, C.
and
Detavernier, C.
2016.
Texture in thin film silicides and germanides: A review.
Applied Physics Reviews,
Vol. 3,
Issue. 3,
p.
031302.
Schrauwen, A.
Demeulemeester, J.
Deduytsche, D.
Devulder, W.
Detavernier, C.
Comrie, C.M.
Temst, K.
and
Vantomme, A.
2017.
Ternary silicide formation from Ni-Pt, Ni-Pd and Pt-Pd alloys on Si(100): Nucleation and solid solubility of the monosilicides.
Acta Materialia,
Vol. 130,
Issue. ,
p.
19.
Semenova, Elena
2021.
Ni-Pd-Si Ternary Phase Diagram Evaluation.
MSI Eureka,
Vol. 89,
Issue. ,
p.
10.32873.2.9.