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Surface and Thin Film Analysis of Metals and Semiconductors using X-Ray Photoelectron Spectroscopy

Published online by Cambridge University Press:  06 March 2019

S. Hofmann
S. Hofmann*
Affiliation:
Max-Planck-Institut für Metallforschung Institut für Werkstoffwissenschaft Seestr. 92, D-7000 Stuttgart 1
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Abstract

X-ray excited Photoelectron Spectroscopy (XPS) has become an indispensable tool for the study of metals and semiconductors. Due to the small mean free path of the photoelectrons In solids of the order of a few nanometers for energies in the keV range, it is a surface analysis technique. Its capability of quantitative analysis of all elements except hydrogen and helium and their chemical bonding states has recently been combined with small area and imaging analysis to typical spatial resolutions of about 10 μm. After a brief survey of the basic capabilities and limitations of XPS, some illustrative examples in typical metals and semiconductor research areas are presented, such as surface contamination and failure analysis in microelectronics, oxidation and corrosion, segregation at surfaces and interfaces, oxide/metal and oxide/semiconductor interfaces, and thin film analysis using angle resolved XPS and sputter depth profiling. Recent developments emphasize improved data evaluation and quantification schemes as well as instrumental capabilities with respect to both high spatial and energy resolution, and high power excitation sources such as synchrotron radiation.

Type
XI. Thin-Film and Surface Characterization by XRS and XPS
Information
Advances in X-Ray Analysis , Volume 35 , Issue B: First Pacific-International Congress on X-ray Analytical Methods (PICXAM). Fortieth Annual Conference on Applications of X-ray Analysis, August 7-16, 1991 , 1991 , pp. 883 - 897
Copyright
Copyright © International Centre for Diffraction Data 1991

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References

1. Siegbahn, K. et al., ESCA Applied to Free Molecules, North Holland Publ. Comp., Amsterdam (1969).Google Scholar
2. Fadley, C. S., in: Electron Spectroscopy - Theory, Techniques and Applications, C.R. Brundle and A.D. Baker, eds., Academic Press, London, Vol. 2 (1978).Google Scholar
3. Briggs, D. and Seah, M. P, eds., Practical Surface Analysis Vol.1 1: Auger X-ray Photoelectron Spectroscopy, J. Wiley, Chichester (1990).Google Scholar
4. Wagner, C. D., Riggs, W. M., Davis, L. E., Moulder, J. E and Muilenberg, G. E., Handbook of XPS, Phys, Electronics Div., Perkin-Elmer Corp., Eden Prairie (USA) (19879).Google Scholar
5. NIST XPS Database, compiled by CD. Wagner (1989).Google Scholar
6. Scofield, J. H., J. Elector. Spectr. Rel. Phen. 8: 129 (1976).10.1016/0368-2048(76)80015-1Google Scholar
7. Seah, M. P. and Dench, W., Surf. Interface Anal. 1: 2 (1979).Google Scholar
8. Tanuma, T., Powell, C. J. and Penn, D. R., Surf. Interface Anal. 11: 577 (1988).Google Scholar
9. Cazaux, J., Appl. Surf. Sci. 20: 457 (1985).Google Scholar
10. Hunt, C. P., Stoddart, C. T. H. and Seah, M. P., Surf. Interface Anal. 3: 157 (1981).10.1002/sia.740030404Google Scholar
11. Powell, C. J. and Seah, M. P., J. Vac. Sci. Technol. A8: 735 (1990).Google Scholar
12. Thomas, J. H. III in: H Windawi and F.-L. Ho, eds., Applied ESCA, J. Wiley, New York (1982), p. 37.Google Scholar
13. Kolbesen, B. O. and Pamler, W., Fresenius Z. Anal. Chem. 333: 561 (1989).Google Scholar
14. Hofmann, S. and Sanz, J. M., Surf. Interface Anal. 6: 75 (1984)10.1002/sia.740060207Google Scholar
15. Gurker, N., Ebel, M. F. and Ebel, H., Surf. Interface Anal. 5: 13 (1983)Google Scholar
16. Chaney, R. L., Surf. Interface Anal. 10: 36 (1987).10.1002/sia.740100108Google Scholar
17. Baer, D. R., Clayton, C. R. and Davis, G. D., eds., Proc. of the Symp. on: The Application of Surface Analysis Methods to Environmental/Materials Interactions. The Electrochemical Society Inc., Pennington, N.,J. (1991).Google Scholar
18. Castle, J. E., Surf. Interface Anal. 9: 345 (1986).10.1002/sia.740090602Google Scholar
19. Landolt, D., Surf. Interface Anal. 15: 395 (1990).Google Scholar
20. Mclntyre, S., chap. 10, p. 397 in ref. 3.Google Scholar
21. Sanz, J. M. and Hofmann, S., J. Less Comm. Metals 92: 317 (1983).10.1016/0022-5088(83)90498-8Google Scholar
22. Steffen, J. and Hofmann, S., Fres. Z. Anal. Chem. 329: 250 (1987).10.1007/BF00469151Google Scholar
23. Morant, C., Sanz, J. M., Galan, L., Soriano, L. and Rueda, F., Surf. Sci. 218: 331 (1989).Google Scholar
24. Knote, H., Hofmann, S. and Fischmeister, H., Fres. Z. Anal. Chem. 329: 292 (1987).10.1007/BF00469159Google Scholar
25. Bruesch, P., Miiller, K., Atrus, A. and Neff, H., Appl. Phys. A38:1 (1985).Google Scholar
26. Kirchheim, R., Heine, B., Hofmann, S. and Hofsäß, H., Corrosion Sci. 31: 573 (1990).Google Scholar
27. Hofmann, S., Vacuum 40: 9 (1990).Google Scholar
28. Hetzendorf, G. and Varga, P., Nucl Instr. Meth. Phys. Res. B18: 501 (1987).Google Scholar
29. Panznei, G. and Diekmann, W., Surf. Sci. 160:253 (1985).Google Scholar
30. Diekmann, W., Panzner, G. and Grabke, H. J., Surf. Sci. 218: 507 (1989).Google Scholar
31. Egert, B. and Panzner, G., Surf. Sci. 118: 345 (1982).10.1016/0039-6028(82)90034-6Google Scholar
32. van Ooij, W. J., Sabata, A. and Apelhans, A. D., Surf. Interface Anal. 17: 403 (1991).Google Scholar
33. Grunthaner, F. J. and Grunthaner, P. J., Mater. Sci. Rep. 1: 65 (1986).Google Scholar
34. Hattori, T., Proc. ICMCTF91, San Diego, 22-26 April 1991, to be publ. in Thin Solid Films.Google Scholar
35. Fadley, C. S., Porgr. in Solid State Chemistry 11: 265 (1976).Google Scholar
36. Ebel, M. F., J. Electron Spectr. Rel. Phen. 14: 287 (1978).Google Scholar
37. Ebel, M. F., Surf. Interface Anal. 3: 333 (1981).Google Scholar
38. Olefjord, I., Mathieu, H. J. and Marcus, P., Surf. Interface Anal. 15: 681 (1990).10.1002/sia.740151108Google Scholar
39. Hofmann, S., Analysis 9: 181 (1981).Google Scholar
40. Bussing, T. D. and Holloway, P. H., J. Vac. Sci. Technol. A3: 1973 (1985).Google Scholar
41. Tougaard, S., Surf. Interface Anal. 11: 453 (1988).10.1002/sia.740110902Google Scholar
42. Tougaard, S. and Hansen, H. S., Surf. Interface Anal. 14: 730 (1989).Google Scholar
43. Hofmann, S. and Sanz, J. M., J. Trace Microprobe Techn. 1:213 (1982-83).Google Scholar
44. Malherbe, J. B., Hofmann, S. and Sanz, J. M., Appl. Surf. Sci. 27: 355 (1986).Google Scholar
45. Hofmann, S. and Mader, W., Surf. Interface Anal, 15: 794 (1990).Google Scholar
46. Chakraborty, B. R. and Hofmann, S., to be publ. in Thin Solid Films.Google Scholar
47. Le, I. Strydom, R. and Hofmann, S., J. Electron Spectr. Rel. Phen. 56: 85 (1981).Google Scholar