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Instrumentation for Total Reflection Fluorescent X-Ray Spectrometry

Published online by Cambridge University Press:  06 March 2019

Tadashi Utaka
Affiliation:
Rigaku Industrial Corporation Takatsuki, Osaka, Japan
Tomoya Arai
Affiliation:
Rigaku Industrial Corporation Takatsuki, Osaka, Japan
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Abstract

This article describes the instrumentation for a total reflection fluorescent x-ray spectrometer. The reflecting intensity and the angular divergence were studied with respect to various kinds of monochromators. Using silicon wafers, the angular divergence effect of the incident beam, surface roughness influences and the smoothing of background x-ray intensity for the improvement of the lower limit of detection were investigated.

Type
XII. Total Reflection XRS
Copyright
Copyright © International Centre for Diffraction Data 1991

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References

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