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Depth Profiling by Means of X-Ray Photoelectron Spectrometry

Published online by Cambridge University Press:  06 March 2019

M.F. Ebel ,
H. Ebel  and
F. Olcaytug
M.F. Ebel
Affiliation:
Institut für Angewandte und Technische Physik Technische Universität Wien, A 1040 Wien (Austria)
H. Ebel
Affiliation:
Institut für Angewandte und Technische Physik Technische Universität Wien, A 1040 Wien (Austria)
F. Olcaytug
Affiliation:
Institut für Allgemeine Elektrotechnik und Elektronik Technische Universität Wien, A 1040 Wien (Austria)
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Extract

The depth range d of x-ray photoelectron spectrometry (XPS) is determined by the inelastic mean free path λ of photoelectrons . The following considerations are dedicated to a correlation between d and λ.

Type
XI. Thin-Film and Surface Characterization by XRS and XPS
Information
Advances in X-Ray Analysis , Volume 35 , Issue B: First Pacific-International Congress on X-ray Analytical Methods (PICXAM). Fortieth Annual Conference on Applications of X-ray Analysis, August 7-16, 1991 , 1991 , pp. 857 - 867
Copyright
Copyright © International Centre for Diffraction Data 1991

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References

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